The coating process of calcium fluoride materials can be carried out using methods such as physical vapor deposition, chemical vapor deposition, or sputtering.
Physical vapor deposition method
Heat calcium fluoride to high temperature, evaporate and deposit it on the substrate to form an optical film.
Chemical vapor deposition method
Heat the compound of calcium fluoride to high temperature to decompose and deposit on the substrate to form an optical film.
Sputtering method
Heat the calcium fluoride target material to high temperature to emit ions and deposit them on the substrate to form an optical film.
During the coating process, vacuum coating technology and optical coating technology are key. Vacuum coating refers to the method of heating metal or non-metallic materials under high vacuum conditions to evaporate and condense into a film on the surface of coated components (metal, semiconductor, or insulator). Optical coating refers to the process of depositing a layer (or multiple layers) of metal (or dielectric) film on the surface of optical components, with the aim of reducing or increasing the requirements for reflection, splitting, color separation, filtering, and polarization of light.
During the coating process, the transformation of material morphology is inevitable, thus generating stress in the film layer. These stresses can be tensile stress, compressive stress, or thermal stress on the film layer and substrate. The presence of stress may have a negative impact on the strength of the film, so it is necessary to pay attention to controlling the coating conditions and parameters to obtain high-quality calcium fluoride optical films.
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